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Digital Thermometer for Temperature Controlled Development of EBeam Resist

JWNC users have access to miscellaneous equipment items important for micro and nanofabrication. This includes 32 laminar flow cabinets for substrate processing, resist spinners, and vacuum hot plates

Resist spinners
The JWNC has five Headway programmable spinners used for applying a range of resist films to substrates up to eight inch wafers.

Baltec CPD 404 critical point dryer
Critical point drying is particularly useful when developing high aspect ratio resist patterns These are easily damaged by conventional blow drying techniques and from surface tension forces which are at the phase boundary as liquid evaporates.

J.I.P. ELEC Jetfirst RTA
  • 4 inch substrates
  • Temp range - to 1250 °C
  • Max power 30 kW
  • 12 lamps
  • 2 zones
  • Deep wedge wire bonder
    This is used to make electrical connections between fabricated bonding pads on substrates and the outsude world for example to chip carriers or circuit boards.

    Laminar air flow cabinets
    The JWNC has 32 laminar air flow cabinets (LAF) and each is dedicated to specific activities. Similar activities are carried out within the same laboratory - for example resist spinning, aqueous processing and mixed aqueous and organic processing.

    Oxygen barrel asher
    Our Gala Instruments Plasmaprep 5 asher is mainly used after lithography to remove residual layers of resist prior to etching or metallisation.

    Ellipsometry is a method used to establish the thickness, index, loss index and roughness of thin films.

    Vacuum hot plates and ovens
    Vacuum hot plates, surface thermometers and ovens are important for the application of resists and the development of resist patterns. This is particularly true for chemically amplified resists which commonly require a carefully controlled post exposure bake.

    Nanoinjection Moulding
    The injection mold system allows 3D patterns with features down to 20 nm to be injection molded. The masters are produced in the JWNC clean room using electron beam lithography and dry etch before being placed into the tool and use to produce many duplicate components in plastic or polymer materials. This technology is being used to research manufacturable nanoscale and nanotechnology based applications in biotechnology, lab-on-a-chip and healthcare.


    Plasma Processing
    Partner Facilities