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spacer High Resolution Lithography
Nanoimprint Lithography
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Vistec VB6 UHR EWF Tool

  • Fully automated computer controlled imprinting cycles
  • Graphical data logging
  • Max temperature 250 °C
  • Max pressure 70 bar - but normally used at around 20 bar
  • Feature sizes down to 20 nm
  • Substrate sizes up to 65 mm

 

 
Vistec VB6 UHR EWF
Nanoimprint Lithography
 

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