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Dry Etch Tool

Kelvin Nanotechnology manufactures 65 mm by 65 mm quartz UV-NIL stamps for use in step & flash nanoimprint lithography. The stamps can be customised with different mesa sizes and patterns to customer specifications. Positive and negative tone electron beam lithography is used to produce high resolution patterns down to 20 nm. Demonstration plates and standard resolution test plates are available. A key feature of Kelvin UV-NIL Stamps is fast turnaround. Starting substrates are 65 mm by 65 mm in size, eliminating the long delays due to cutting down and polishing larger quartz plates. UV-NIL can produce patterns with feature sizes comparable with electron beam lithography but with cost effective and fast throughput.

Nickel stamps are used routinely for embossing nano-features below 50 nm over large areas with excellent fidelity and low cost. In partnership with electroforming experts, Kelvin Nanotechnology supplies Nickel stamps with high resolution structures over large areas using electron beam lithography. Multiple shims can be produced from a single pattern with minimal degradation allowing us to deliver cost effective solutions for large area nano patterning. Shims can be supplied laser cut, polished and laser welded into large format shims for roll to roll embossing applications.

Silicon stamps are supplied by Kelvin Nanotechnology in wafer form for embossing applications such as optics, biomimetics, electronics and sensors. Wafers up to 150 mm (6”) are offered with high resolution electron beam structures etched into the silicon surface.

 

 
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