Production Electron Beam Lithography
With 30 years of experience working on fully supported commercial electron beam lithography tools, Kelvin Nanotechnology is ideally suited to providing high resolution solutions for your manufacturing needs.
The images shown above demonstrate production-level high resolution electron beam lithography of lines and dots formed in resist. We routinely deliver 20 nm sized features and have the pattern transfer capability for a wide range of materials. Nanometre level-to-level alignment accuracy is made possible by our in-house software and marker design.
Large and small volumes can be accommodated on most material systems.
We specialise in running long e-beam lithography jobs at an affordable price.
Please contact us to discuss your specific requirements.